Ball mill to reduce ore size

UNIT OPERATION

Comminution

typical Applications
Cement

Dispersed systems

Unit operations

Jet Milling

Jet Milling

Show application

Dispersed systems

Unit operations

Coffee

Dispersed systems

Unit operations

Chocolate

Dispersed systems

Unit operations

Ore Dressing

Ore Dressing

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Dispersed systems

Unit operations

Calcium Carbonate

Calcium Carbonate

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Dispersed systems

Unit operations

Lead Oxide

Dispersed systems

Unit operations

Anode Coke

Dispersed systems

Unit operations

Graphite

Dispersed systems

Unit operations

Powder Coatings

Powder Coatings

Show application

Dispersed systems

Unit operations

Methylcellulose

Methylcellulose

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Dispersed systems

Unit operations

Nitrocellulose

Nitrocellulose

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Dispersed systems

Unit operations

Inks

Dispersed systems

Unit operations

Wood Fibres

Wood Fibres

Show application

Dispersed systems

Unit operations

Baclofen

Dispersed systems

Unit operations

typical Configurations
HELOS/BR + RODOS/L + VIBRI/L

HELOS/BR + RODOS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 875 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + RODOS/L + VIBRI/L

QICPIC + RODOS/L + VIBRI/L

boost: 6

Image Analysis | Dry
Size range: 1.8 µm - 4,000 µm
Sample amount: 0.5 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

MYTOS + VIBRI Module

MYTOS + VIBRI Module

boost: 1

Laser Diffraction | Dry
Size range: 0.25 µm - 1,750 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + RODOS/L + VIBRI/L

HELOS/KR + RODOS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 3,500 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + OASIS/L + VIBRI/L

HELOS/BR + OASIS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 875 µm
Sample amount: < 1 mg - 1,000 g
Laser Diffraction | Wet
Size range: 0.1 µm - 875 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + RODOS/L + VIBRI/L at-line

HELOS/BR + RODOS/L + VIBRI/L at-line

boost: 5

Laser Diffraction | Dry
Size range: 0.1 µm - 875 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + RODOS/L + ASPIROS

HELOS/BR + RODOS/L + ASPIROS

boost: 3

Laser Diffraction | Dry
Size range: 0.1 µm - 875 µm
Sample amount: < 1 mg - 1 g
Sample volume: 650 µl

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Suited for

Typical applications

Applied for control of

HELOS/KR + RODOS/L + VIBRI/R

HELOS/KR + RODOS/L + VIBRI/R

boost: 3

Laser Diffraction | Dry
Size range: 0.1 µm - 3,500 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + OASIS/L + VIBRI/L

HELOS/KR + OASIS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 3,500 µm
Sample amount: < 1 mg - 1,000 g
Laser Diffraction | Wet
Size range: 0.1 µm - 1,750 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + FIBROS

QICPIC + FIBROS

boost:

Image Analysis | Dry
Fibre diameter: 1.8 µm - 5,000 µm
Fibre length: 500 µm - 30,000 µm
Sample amount: 0.5 g - 20 g

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Suited for

Typical applications

Applied for control of

QICPIC + GRADIS + VIBRI/L

QICPIC + GRADIS + VIBRI/L

boost: 6

Image Analysis | Dry
Size range: 1.8 µm - 18,000 µm
Sample amount: 10 g - 1,000 g

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Suited for

Typical applications

Applied for control of

QICPIC + OASIS/L + VIBRI/L

QICPIC + OASIS/L + VIBRI/L

boost: 6

Image Analysis | Dry
Size range: 1.8 µm - 4,000 µm
Sample amount: 0.5 mg - 1,000 g
Image Analysis | Wet
Size range: 1 µm - 2,000 µm
Analysis volume: 50 ml / 400 ml

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + RODOS/L + ASPIROS

QICPIC + RODOS/L + ASPIROS

boost: 3

Image Analysis | Dry
Size range: 1.8 µm - 500 µm
Sample amount: 1 mg - 1 g
Analysis volume: 650 µl

Show configuration

Suited for

Typical applications

Applied for control of

MYTOS + TWISTER on-line

MYTOS + TWISTER on-line

boost: 7

Laser Diffraction | Dry
Size range: 0.25 µm - 3,500 µm
Mass flow rate: 1 kg/h - 100+ t/h

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Suited for

Typical applications

Applied for control of

MYTOS + TWISTER in-line

MYTOS + TWISTER in-line

boost: 4

Laser Diffraction | Dry
Size range: 0.25 µm - 1,750 µm
Mass flow rate: 1 kg/h - 100+ t/h

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Suited for

Applied for control of

MYTOS + MIXER

MYTOS + MIXER

boost: 5

Laser Diffraction | Dry
Size range: 0.25 µm - 3,500 µm
Mass flow rate: 1 kg/h - 400 kg/h

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Suited for

Typical applications

Applied for control of

MYTOS + SCREWSAMPLER

MYTOS + SCREWSAMPLER

boost: 5

Laser Diffraction | Dry
Size range: 0.25 µm - 1,750 µm
Mass flow rate: 1 kg/h - 1 t/h

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Suited for

Typical applications

Applied for control of

MYTOS + Probe

MYTOS + Probe

boost: 6

Laser Diffraction | Dry
Size range: 0.25 µm - 3,500 µm
Mass flow rate: 1 kg/h- 3 t/h

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Suited for

Typical applications

Applied for control of

MYTOS + VIBRI

MYTOS + VIBRI

boost: 4

Laser Diffraction | Dry
Size range: 0.25 µm - 3,500 µm
Sample amount: < 1 mg - 1,000 g

Show configuration

Suited for

Typical applications

Applied for control of

PICTOS + TWISTER

PICTOS + TWISTER

boost: 6

Image Analysis | Dry
Size range: 1.8 µm - 3,500 µm
Mass flow rate: > 0 kg/h - 100+ t/h

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Suited for

Typical applications

Applied for control of

PICTOS + VIBRI/L

PICTOS + VIBRI/L

boost: 5

Image Analysis | Dry
Size range: 1.8 µm - 3,500 µm
Sample amount: 0.5 mg - 1,000 g

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Suited for

Typical applications

Applied for control of

typical Configurations
HELOS/BR + QUIXEL

HELOS/BR + QUIXEL

boost: 6

Laser Diffraction | Wet
Size range: 0.1 µm - 875 µm
Analysis volume: 300 ml - 1,000 ml

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Suited for

Typical applications

Applied for control of

QICPIC + LIXELL

QICPIC + LIXELL

boost: 6

Image Analysis | Wet
Size range: 1 µm - 2,000 µm
Analysis volume: 20 ml - 5 l/min

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Suited for

Typical applications

Applied for control of

OPUS-FT

OPUS-FT

boost: 4

Ultrasonic Extinction | Wet
Size range: < 0.1 µm - 3,000 µm
Flow rate: < 2,000 l/h
Analysis volume: 10 l/h - 1,000 l/h

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Suited for

Typical applications

Applied for control of

NANOPHOX | Particle size analysis and stability of nano suspensions in laboratory

NANOPHOX | Particle size analysis and stability of nano suspensions in laboratory

boost: 5

DLS | Nanoparticles
Size range: 0.5 nm - 10,000 nm
Analysis volume: 50 µl - 4 ml

Show configuration
HELOS/BR + OASIS/L + VIBRI/L

HELOS/BR + OASIS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 875 µm
Sample amount: < 1 mg - 1,000 g
Laser Diffraction | Wet
Size range: 0.1 µm - 875 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + SUCELL

HELOS/BR + SUCELL

boost: 5

Laser Diffraction | Wet
Size range: 0.1 µm - 875 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + CUVETTE 50

HELOS/BR + CUVETTE 50

boost: 5

Laser Diffraction | Wet
Size range: 0.25 µm - 3,500 µm
Analysis volume: 30 ml - 50 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/BR + SYSIPHUS

HELOS/BR + SYSIPHUS

boost: 5

Laser Diffraction | Wet
Size range: 0.1 µm - 875 µm
Analysis volume: 50 ml

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Suited for

Typical applications

Applied for control of

HELOS/BR + CUVETTE 6

HELOS/BR + CUVETTE 6

boost: 5

Laser Diffraction | Wet
Size range: 0.1 µm - 87.5 µm
Analysis volume: 4 ml - 6 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + QUIXEL

HELOS/KR + QUIXEL

boost: 6

Laser Diffraction | Wet
Size range: 0.1 µm - 3,500 µm
Analysis volume: 300 ml - 1,000 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + OASIS/L + VIBRI/L

HELOS/KR + OASIS/L + VIBRI/L

boost: 6

Laser Diffraction | Dry
Size range: 0.1 µm - 3,500 µm
Sample amount: < 1 mg - 1,000 g
Laser Diffraction | Wet
Size range: 0.1 µm - 1,750 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + SUCELL

HELOS/KR + SUCELL

boost: 5

Laser Diffraction | Wet
Size range: 0.1 µm -1,750 µm
Analysis volume: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

HELOS/KR + CUVETTE 50

HELOS/KR + CUVETTE 50

boost: 5

Laser Diffraction | Wet
Size range: 0.25 µm - 3,500 µm
Analysis volume: 30 ml - 50 ml

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + OASIS/L + VIBRI/L

QICPIC + OASIS/L + VIBRI/L

boost: 6

Image Analysis | Dry
Size range: 1.8 µm - 4,000 µm
Sample amount: 0.5 mg - 1,000 g
Image Analysis | Wet
Size range: 1 µm - 2,000 µm
Analysis volume: 50 ml / 400 ml

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + SUCELL/L

QICPIC + SUCELL/L

boost: 6

Image Analysis | Wet
Size range: 0.55 µm - 2,000 µm
Sample amount: 50 / 500 ml

Show configuration

Suited for

Typical applications

Applied for control of

QICPIC + LIXELL + LIQXI

QICPIC + LIXELL + LIQXI

boost: 5

Image Analysis | Wet
Size range: 1 µm - 500 µm
Analysis volume: 250 ml - 400 ml

Show configuration

Suited for

Typical applications

Applied for control of

OPUS-BP

OPUS-BP

boost: 5

Ultrasonic Extinction | Wet
Size range: < 0.1 µm - 3,000 µm
Flow rate: < 10,000 l/h
Analysis volume: 10 l/h - 1,000 l/h

Show configuration

Suited for

Typical applications

Applied for control of

OPUS-FT off-line

OPUS-FT off-line

boost: 3

Ultrasonic Extinction | Wet
Size range: < 0.1 µm - 3,000 µm
Flow rate: < 2,000 l/h
Analysis volume: 10 l/h - 1,000 l/h

Show configuration

Suited for

Typical applications

Applied for control of

NIMBUS | Particle size and concentration analysis in laboratory

NIMBUS | Particle size and concentration analysis in laboratory

boost: 3

Ultrasonic Extinction | Wet
Size range: < 0.1 µm - 3,000 µm
Analysis volume: 250 ml - 1,000 ml

Show configuration

Suited for

Typical applications

Applied for control of